< BK21 플러스 BEST 정보기술 사업단 세미나 개최 안내 >

개최일시 : 2016년 10월 25일 화요일 16:00 ~ 17:00

개최장소 : 제 2공학관 B039호

세미나 제목 : In situ characterization during Atomic Layer Deposition

발표초록 :                                                                                                                             

•In situ techniques are required to

–efficiently optimize ALD process parameters

–obtain a fundamental understanding of ALD reactions

•Variouslab-basedin situ techniques

–Spectroscopicellipsometry

–Fourier-transforminfraredspectroscopy

•Synchrotron basedin situtechniquescan provide unique insights in ALD growth

–In situXRF and GISAXS can monitor the initial stages of nucleation and growth during ALD.

–In situXRF and GISAXS can provide unique insights in ALD coating of large surface area substrates

강연자 : Christophe Detavernier  / Department of Solid-state Sciences at UGent

초청자 : 전기전자공학과 교수 김형준