Prof. Hyun Jae Kim’s Research Team Publishes a Paper on Journal of Materials Chemistry C (IF: 5.256)
Date
2018.05.02
Writer
전기전자공학부
게시글 내용
※Prof. Hyun Jae Kim’s research team developed simple fabrication process of high-k gate insulator at low temperature. The thermal process for precursor solution used in this study assists film formation at low temperature. Thus, it is expected to be applied to flexible electronics widely.
※This research was guided by Prof. Hyun Jae Kim (contact author) and led by graduate student Jusung Chung (first author).
※Prof. Hyun Jae Kim’s research team developed simple fabrication process of high-k gate insulator at low temperature. The thermal process for precursor solution used in this study assists film formation at low temperature. Thus, it is expected to be applied to flexible electronics widely.※This research was guided by Prof. Hyun Jae Kim (contact author) and led by graduate student Jusung Chung (first author).